Challenges in realizing ultraflat materials surfaces

• Takashi Yatsui,
• Wataru Nomura,
• Fabrice Stehlin,
• Olivier Soppera,
• Makoto Naruse and
• Motoichi Ohtsu

Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99

• model that describes the scale-dependent effects of optical near-fields. Finally, we present the future outlook for these technologies. Keywords: dressed photon–phonon; phonon-assisted process; polishing; self-organized process; Review Introduction In order to improve device performance and to

• etching process stops automatically when the surface becomes flat and more homogeneous, because then the DPPs disappear. Therefore, surface smoothing by utilising DPPs is a self-organized process [26]. The DPP etching technique was developed to smooth various materials, including SiO2 (fused silica and